Spherical Silica

Megasil™ SS

Description

Spherical Silica powders are used in the production of Epoxy Moulding Compounds (EMCs) and green EMCs (halogen-free, antimony-free). These thermosetting materials encapsulate and protect semiconductor devices (e.g., memory integrated circuits (ICs) tied to 5G and IoT devices) from physical and environmental damage. Their applications include consumer, automotive, and industrial electronics.

  • Consumer
  • Automotive
  • Industrial Electronics

Low-A Grades

Physical Characteristics

Size SS-U130R SS-U130H4 SS-U052H2 SS-U020H Unit Method
% Passing on Ind. Sieve
<2μm
7.22
12.12
11.86
36.31
%
CILAS Laser
<5μm
24.1
32.02
50.71
86.94
%
CILAS Laser
<8μm
34.55
40.29
80.22
98.30
%
CILAS Laser
<12μm
46.33
49.63
95.07
100.00
%
CILAS Laser
<25μm
66.78
77.56
100.00
100.00
%
CILAS Laser
<45μm
90.09
98.96
100.00
100.00
%
CILAS Laser
<75μm
99.76
100.00
100.00
100.00
%
CILAS Laser
Particle Size
D10
2.36
1.83
1.87
1.06
μm
CILAS Laser
D50
13.56
12.16
4.94
2.51
μm
CILAS Laser
D90
13.56
12.16
4.94
2.51
μm
CILAS Laser
Moisture Content
0.01
0.01
0.01
0.02
wt.%
105°C oven
pH Value
4.81
4.49
5.25
4.50
pH meter
Specific Gravity
2.21
2.21
2.21
2.21
pycnometer
Electrical Conductivity
2.3
1.70
0.40
6.40
μs/cm
E.C meter
Specific Surface Area
4.5
3.86
1.16
28.20
m2/g
BET
Circularity
0.97
0.95
0.97
FPIA

Mean values. These do not represent a specification.

Chemical Analysis (XRF)

SS-U130R SS-U130H4 SS-U052H2 SS-U020H Unit Method
SiO2
99.8
99.9
99.9
99.9
ppm
XRF
Al2O3
826
491
129
654
ppm
XRF
Fe2O3
47
48
40
133
ppm
XRF
Na2O
47
15
25
32
ppm
XRF

Mean values. These do not represent a specification.

Ionic Impurities (IC)

SS-U130R SS-U130H4 SS-U052H2 SS-U020H Unit Method
Na+
2.4
1.0
1.1
8.4
ppm
I.C
Cl
1.3
0.4
0.9
1.4
ppm
I.C

Mean values. These do not represent a specification.

Standard Grades, Blended Type

Physical Characteristics

Size SS-0140R SS-0160R SS-0160H SS-0170R SS-0140C5 Unit Method
% Passing on Ind. Sieve
<2μm
7.98
8.99
8.16
8.29
36.31
%
CILAS Laser
<5μm
25.73
27.76
30.96
26.04
27.84
%
CILAS Laser
<8μm
34.00
37.29
40.17
35.80
36.50
%
CILAS Laser
<12μm
42.67
47.68
47.59
43.00
45.61
%
CILAS Laser
<25μm
59.71
67.73
62.03
60.46
64.61
%
CILAS Laser
<45μm
88.01
90.70
86.86
86.90
91.94
%
CILAS Laser
<75μm
99.74
99.80
99.61
99.63
99.91
%
CILAS Laser
Particle Size
D10
2.24
2.11
2.23
2.20
2.12
μm
CILAS Laser
D50
16.71
13.08
13.60
16.49
12.98
μm
CILAS Laser
D90
47.23
44.15
48.58
48.46
42.45
μm
CILAS Laser
Moisture Content
0.01
0.01
0.01
0.01
0.01
wt.%
105°C oven
pH Value
4.45
4.50
4.50
4.54
4.40
pH meter
Specific Gravity
2.21
2.21
2.21
2.21
2.21
pycnometer
Electrical Conductivity
1.70
1.70
1.70
1.30
2.20
μs/cm
E.C meter
Specific Surface Area
3.20
4.90
3.90
3.70
4.10
m2/g
BET
Circularity
0.95
0.95
0.95
0.95
0.96
FPIA

Mean values. These do not represent a specification.

Chemical Analysis (XRF)

SS-0140R SS-0160R SS-0160H SS-0170R SS-0140C5 Unit Method
SiO2
99.8
99.8
99.8
99.8
99.8
%
XRF
Al2O3
1119
998
898
926
1189
ppm
XRF
Fe2O3
75
50
38
51
67
ppm
XRF
Na2O
59
43
19
53
26
ppm
XRF

Mean values. These do not represent a specification.

Ionic Impurities (IC)

SS-0140R SS-0160R SS-0160H SS-0170R SS-0140C5 Unit Method
Na+
1.8
2.2
1.3
1.7
2.0
ppm
I.C
Cl
2.1
1.3
1.3
1.5
1.8
ppm
I.C

Mean values. These do not represent a specification.

Standard Grades, Singular Component

Physical Characteristics

Size SS-0030 SS-0090 SS-0250 SS-0300 Unit Method
% Passing on Ind. Sieve
<2μm
12.23
8.9
4.68
4.73
%
CILAS Laser
<5μm
53.92
26.74
12.91
14.63
%
CILAS Laser
<8μm
72.26
43.04
17.09
19.78
%
CILAS Laser
<12μm
86.45
67.14
24.33
27.20
%
CILAS Laser
<25μm
99.42
96.99
48.14
47.51
%
CILAS Laser
% Passing on Ind. Sieve
<45μm
100
100
80.53
78.05
%
CILAS Laser
<75μm
100
100
99.63
99.48
%
CILAS Laser
Particle Size
D10
1.65
2.12
3.46
3.20
μm
CILAS Laser
D50
4.55
9.09
26.04
26.70
μm
CILAS Laser
D90
13.59
18.73
53.26
54.94
μm
CILAS Laser
Moisture Content
0.02
0.01
0.01
0.01
wt.%
105°C oven
pH Value
4.14
4.86
4.96
5.01
pH meter
Specific Gravity
2.21
2.21
2.21
2.21
pycnometer
Electrical Conductivity
4.8
1.7
0.80
0.90
μs/cm
E.C meter
Specific Surface Area
11.6
1.6
1.1
0.9
m2/g
BET
Circularity
0.85
0.91
0.85
0.87
FPIA
Sieve Residue
45 μm On
0.14
0.04
11.58
11.93
wt.%
Wet Sieve
Sieve Residue
75 μm On
0
0
0.02
0.02
wt.%
Wet Sieve
Sieve Residue
106 μm On
0
0
0
wt.%
Wet Sieve

Mean values. These do not represent a specification.

Chemical Analysis (XRF)

SS-0030 SS-0090 SS-0250 SS-0300 Unit Method
SiO2
99.7
99.8
99.8
99.8
%
XRF
Al2O3
1216
610
597
1040
ppm
XRF
Fe2O3
86
43
48
48
ppm
XRF
Na2O
55
43
40
40
ppm
XRF

Mean values. These do not represent a specification.

Ionic Impurities (IC)

SS-0030 SS-0090 SS-0250 SS-0300 Unit Method
Na+
2.8
2.4
1.3
0.8
ppm
I.C
Cl
2.4
2.6
1.1
1.3
ppm
I.C

Mean values. These do not represent a specification.

Have questions or need more information about
Spherical Silica? Download our product data sheet here.

台湾办事处

No. 6, 10th Floor, No. 65, Gaotie 7th Road, Zhubei City, Hsinchu, Taiwan

中国办事处

No. 1088 Yuanshen road, Suite 1101 Ping’an Fortune Building, Shanghai 200122, China

+86 21 5848 1388

한국사무소

Momentive Technologies Korea Ltd.

7F of WONIK Building, 20, Pangyo-ro 255beon-gil, Bundang-gu, Seongnam-si, Gyeonggi-do,
Republic of Korea

+82 31 8038 9069

日本オフィス

Momentive Technologies Japan KK

Park West 10th floor, 6-12-1, Nishi-Shinjuku, Shinjuku-ku, Tokyo 1600023,
Japan

+81 3 6721 1910