Ceramics Products

Spherical Silica

MEGASIL™ SS

Spherical Silica powders are used in the production of Epoxy Moulding Compounds (EMCs) and green EMCs (halogen-free, antimony-free), which are thermosetting materials encapsulating and protecting semiconductor devices (e.g., memory integrated circuits (ICs) tied to 5G and IoT devices) from physical and environmental damage. Applications: consumer, automotive, and industrial electronics.

GRANULOMETRIC DATA & PHYSICAL CHARACTERISTICS (LOW-a GRADES)

Mean values. These do not represent a specification.

	Size	SS-U130R	SS-U130H4	SS-U052H2	SS-U020H		Method
% Passing on Ind. Sieve	<2μm	7.22	12.12	11.86	36.31	%	CILAS Laser
% Passing on Ind. Sieve	<5μm	24.1	32.02	50.71	86.94	%	CILAS Laser
% Passing on Ind. Sieve	<8μm	34.55	40.29	80.22	98.30	%	CILAS Laser
% Passing on Ind. Sieve	<12μm	46.33	49.63	95.07	100.00	%	CILAS Laser
% Passing on Ind. Sieve	<25μm	66.78	77.56	100.00	100.00	%	CILAS Laser
% Passing on Ind. Sieve	<45μm	90.09	98.96	100.00	100.00	%	CILAS Laser
% Passing on Ind. Sieve	<75μm	99.76	100.00	100.00	100.00	%	CILAS Laser
Particle Size	D10	2.36	1.83	1.87	1.06	μm	CILAS Laser
Particle Size	D50	13.56	12.16	4.94	2.51	μm	CILAS Laser
Particle Size	D90	13.56	12.16	4.94	2.51	μm	CILAS Laser
Moisture Content		0.01	0.01	0.01	0.02	wt.%	105°C oven
pH Value		4.81	4.49	5.25	4.50	-	pH meter
Specific Gravity		2.21	2.21	2.21	2.21	-	pycnometer
Electrical Conductivity		2.3	1.70	0.40	6.40	μs/cm	E.C meter
Specific Surface Area		4.5	3.86	1.16	28.20	m2/g	BET
Circularity		0.97	0.95	0.97	-	-	FPIA

CHEMICAL ANALYSIS (XRF)

	SS-U130R	SS-U130H4	SS-U052H2	SS-U020H		Method
SiO₂	99.8	99.9	99.9	99.9	ppm	XRF
Al₂O₃	826	491	129	654	ppm	XRF
Fe₂O₃	47	48	40	133	ppm	XRF
Na₂O	47	15	25	32	ppm	XRF

IONIC IMPURITIES (IC)

	SS-U130R	SS-U130H4	SS-U052H2	SS-U020H		Method
Na⁺	2.4	1.0	1.1	8.4	ppm	I.C
Cl^-	1.3	0.4	0.9	1.4	ppm	I.C

GRANULOMETRIC DATA & PHYSICAL CHARACTERISTICS (STANDARD GRADES, BLENDED TYPE)

Mean values. These do not represent a specification.

	Size	SS-0140R	SS-0160R	SS-0160H	SS-0170R	SS-0140C5		Method
% Passing on Ind. Sieve	<2μm	7.98	8.99	8.16	8.29	36.31	%	CILAS Laser
% Passing on Ind. Sieve	<5μm	25.73	27.76	30.96	26.04	27.84	%	CILAS Laser
% Passing on Ind. Sieve	<8μm	34.00	37.29	40.17	35.80	36.50	%	CILAS Laser
% Passing on Ind. Sieve	<12μm	42.67	47.68	47.59	43.00	45.61	%	CILAS Laser
% Passing on Ind. Sieve	<25μm	59.71	67.73	62.03	60.46	64.61	%	CILAS Laser
% Passing on Ind. Sieve	<45μm	88.01	90.70	86.86	86.90	91.94	%	CILAS Laser
% Passing on Ind. Sieve	<75μm	99.74	99.80	99.61	99.63	99.91	%	CILAS Laser
Particle Size	D10	2.24	2.11	2.23	2.20	2.12	μm	CILAS Laser
Particle Size	D50	16.71	13.08	13.60	16.49	12.98	μm	CILAS Laser
Particle Size	D90	47.23	44.15	48.58	48.46	42.45	μm	CILAS Laser
Moisture Content		0.01	0.01	0.01	0.01	0.01	wt.%	105°C oven
pH Value		4.45	4.50	4.50	4.54	4.40	-	pH meter
Specific Gravity		2.21	2.21	2.21	2.21	2.21	-	pycnometer
Electrical Conductivity		1.70	1.70	1.70	1.30	2.20	μs/cm	E.C meter
Specific Surface Area		3.20	4.90	3.90	3.70	4.10	m2/g	BET
Circularity		0.95	0.95	0.95	0.95	0.96	-	FPIA

CHEMICAL ANALYSIS (XRF)

	SS-0140R	SS-0160R	SS-0160H	SS-0170R	SS-0140C5		Method
SiO₂	99.8	99.8	99.8	99.8	99.8	%	XRF
Al₂O₃	1119	998	898	926	1189	ppm	XRF
Fe₂O₃	75	50	38	51	67	ppm	XRF
Na₂O	59	43	19	53	26	ppm	XRF

IONIC IMPURITIES (IC)

	SS-0140R	SS-0160R	SS-0160H	SS-0170R	SS-0140C5		Method
Na⁺	1.8	2.2	1.3	1.7	2.0	ppm	I.C
Cl^-	2.1	1.3	1.3	1.5	1.8	ppm	I.C

GRANULOMETRIC DATA & PHYSICAL CHARACTERISTICS (STANDARD GRADES, SINGULAR COMPONENT)

Mean values. These do not represent a specification.

	Size	SS-0030	SS-0090	SS-0250	SS-0300		Method
% Passing on Ind. Sieve	<2μm	12.23	8.9	4.68	4.73	%	CILAS Laser
% Passing on Ind. Sieve	<5μm	53.92	26.74	12.91	14.63	%	CILAS Laser
% Passing on Ind. Sieve	<8μm	72.26	43.04	17.09	19.78	%	CILAS Laser
% Passing on Ind. Sieve	<12μm	86.45	67.14	24.33	27.20	%	CILAS Laser
% Passing on Ind. Sieve	<25μm	99.42	96.99	48.14	47.51	%	CILAS Laser
% Passing on Ind. Sieve	<45μm	100	100	80.53	78.05	%	CILAS Laser
% Passing on Ind. Sieve	<75μm	100	100	99.63	99.48	%	CILAS Laser
Particle Size	D10	1.65	2.12	3.46	3.20	μm	CILAS Laser
Particle Size	D50	4.55	9.09	26.04	26.70	μm	CILAS Laser
Particle Size	D90	13.59	18.73	53.26	54.94	μm	CILAS Laser
Moisture Content		0.02	0.01	0.01	0.01	wt.%	105°C oven
pH Value		4.14	4.86	4.96	5.01	-	pH meter
Specific Gravity		2.21	2.21	2.21	2.21	-	pycnometer
Electrical Conductivity		4.8	1.7	0.80	0.90	μs/cm	E.C meter
Specific Surface Area		11.6	1.6	1.1	0.9	m2/g	BET
Circularity		0.85	0.91	0.85	0.87	-	FPIA
Sieve Residue	45 μm On	0.14	0.04	11.58	11.93	wt.%	Wet Sieve
Sieve Residue	75 μm On	0	0	0.02	0.02	wt.%	Wet Sieve
Sieve Residue	106 μm On	0	0	0		wt.%	Wet Sieve

CHEMICAL ANALYSIS (XRF)

	SS-0030	SS-0090	SS-0250	SS-0300		Method
SiO₂	99.7	99.8	99.8	99.8	%	XRF
Al₂O₃	1216	610	597	1040	ppm	XRF
Fe₂O₃	86	43	48	48	ppm	XRF
Na₂O	55	43	40	40	ppm	XRF

IONIC IMPURITIES (IC)

	SS-0030	SS-0090	SS-0250	SS-0300		Method
Na⁺	2.8	2.4	1.3	0.8	ppm	I.C
Cl^-	2.4	2.6	1.1	1.3	ppm	I.C

Potential Applications

Consumer
Automotive
Industrial Electronics

Download the product datasheet